Modeling and Simulation of Negative Capacitance MOSFETs

The current and voltage characteristics of a MOSFET device are maily characterized by the source to channel barrier which is controlled by the gate voltage. The Boltazmann statistics which govern the number of carriers that are able to cross the barrier indicates that to increase the current by a decade, atleast 60 mV of rise in gate voltage is required. As a result of this limitation, the threshold voltage of modern MOSFETs cannot be less than about 0.3 V for an ION to IOFF ratio of 5 decades. This has put a fundamental bottleneck in voltage downscaling increasing the power consumption in modern IC based chips with billions of transistors. Sayeef Salahuddin and Supriyo Dutta proposed the idea of including ferroelectric in MOSFET gate stack which allows an internal voltage ampli�cation at the MOSFET channel which can be used to achieve a smaller subthreshold swing which would further reduce the power consumption of the devices. In this thesis we have undertaken a simulation based study of such devices to study how the inclusion of negative capacitance ferroelectrics leads changes in various device characteristics. Initially we have taken a compact modeling based approach to study device characteristics in latest industry standard FinFET devices. For this purpose we have used the BSIM-CMG Verilog A model and modi�ed the model appropriately to include the e�ect of negative capacitance ferroelectric in the gate stack. This simulation allowed us to observe that negative capacitance (NC) devices can indeed give a subthreshold swing lesser than 60 mV/dec. Further other interesting properties like negative output resistance and drain induced barrier rising are observed. Using the compact models developed above, we have analyzed some simple circuits with NC devices. Initially an inverter shows a hysteresis in the transfer characteristics. This can be attributed to negative di�erential resistance. Ring oscillator analysis shows that RO frequency for NC devices is lesser than that of regular devices due to enhanced gate capacitance and slower response of ferroelectrics. Scaling analysis has been performed to see the performance of NC devices in future technologies. For this we used TCAD analysis coupled with Landau Khalatnikov equation. This analysis shows that NC devices are more e�ective in suppressing short channel e�ects like DIBL and can hence be used for further downscaling of the devices. Finally we develop models to take into account the multidomain Landau equations for ferroelec- tric into account. We have performed such an analysis for a ferroelectric resistor series network. A similar analysis is performed for short channel double gate MOSFET without inter layer metal be- tween ferroelectric and the internal MOS device. This analysis showed that coupling factor between ferroelectric domains plays an important role in the device characteristics

Harmonic to anharmonic tuning of moir\'e potential leading to unconventional Stark effect and giant dipolar repulsion in WS2_2/WSe2_2 heterobilayer

Excitonic states trapped in harmonic moir\'e wells of twisted heterobilayers is an intriguing testbed. However, the moir\'e potential is primarily governed by the twist angle, and its dynamic tuning remains a challenge. Here we demonstrate anharmonic tuning of moir\'e potential in a WS$_2$/WSe$_2$ heterobilayer through gate voltage and optical power. A gate voltage can result in a local in-plane perturbing field with odd parity around the high-symmetry points. This allows us to simultaneously observe the first (linear) and second (parabolic) order Stark shift for the ground state and first excited state, respectively, of the moir\'e trapped exciton - an effect opposite to conventional quantum-confined Stark shift. Depending on the degree of confinement, these excitons exhibit up to twenty-fold gate-tunability in the lifetime ($100$ to $5$ ns). Also, exciton localization dependent dipolar repulsion leads to an optical power-induced blueshift of $\sim$1 meV/$\mu$W - a five-fold enhancement over previous reports.Comment: Accepted in Nature Communication